Evaluation of chamber components having textured coatings
A component for a substrate processing chamber comprises a structure having a textured coating with surface grains. The component is evaluated by directing a beam of electrons onto the textured coating of the component to cause at least some of the electrons to be backscattered. The backscattered el...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A component for a substrate processing chamber comprises a structure having a textured coating with surface grains. The component is evaluated by directing a beam of electrons onto the textured coating of the component to cause at least some of the electrons to be backscattered. The backscattered electrons are detected and a signal image is generated. The component is selected when the signal image exhibits surface grains sized from about 0.1 to about 5 micron. In one version, the component is also selected when the grains are substantially flower shaped. |
---|