CD SEM automatic focus methodology and apparatus for constant electron beam dosage control

A method and apparatus for scanning electron microscope measurements which maintains a constant e-beam dose to the surface of a wafer being measured and thereby maintains a constant resist shrinkage. The apparatus provides a magnetic lens, a movable wafer holder to adjust the distance between a wafe...

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Bibliographische Detailangaben
Hauptverfasser: Ke, Chih-Ming, Lin, Chien-Hsun, Ku, Yao-Ching
Format: Patent
Sprache:eng
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