Projection optical system and exposure apparatus
A six-mirror catoptric projection optical system for projecting a reduced size of a pattern on an object onto an image plane includes first, second, third, fourth, fifth, and sixth mirrors from the image plane along an optical path, wherein the third and fourth mirrors are located between the fifth...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A six-mirror catoptric projection optical system for projecting a reduced size of a pattern on an object onto an image plane includes first, second, third, fourth, fifth, and sixth mirrors from the image plane along an optical path, wherein the third and fourth mirrors are located between the fifth mirror and sixth mirror and wherein the catoptric projection optical system forms an intermediate image along the optical path from the third mirror to the fifth mirror. |
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