Radiation detecting element and method of manufacturing the same

The present invention provides a method of preventing or reducing X-ray-induced temporal changes of a semiconductor photoelectric conversion film formed on a TFT substrate, in which a protective film or sheet is used to protect the semiconductor photoelectric conversion film in order to improve weat...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Tsutsui, Hiroshi, Kaneko, Katsuyuki, Yuzu, Takayoshi, Yamamoto, Toshiyoshi, Il, Yoshiteru
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention provides a method of preventing or reducing X-ray-induced temporal changes of a semiconductor photoelectric conversion film formed on a TFT substrate, in which a protective film or sheet is used to protect the semiconductor photoelectric conversion film in order to improve weather resistance such as light blocking effect and moisture resistance.The present invention provides a radiation detecting element characterized by including a substrate having a plurality of pixel areas formed thereon, each having at least one switching element and at least one charge storage capacity, a photoelectric conversion film formed on the individual pixel areas for converting radiation into electrical charge, a protective film individually covering the photoelectric conversion film and having an area that is substantially the same as or larger than that of at least the photoelectric conversion film and a seal member and a sealant arranged so as to enclose the photoelectric conversion film, for fixing the protective film.