Chamber having components with textured surfaces and method of manufacture

A component for a substrate processing chamber has a structure composed of aluminum oxide. The structure has a roughened surface having a roughness average of from about 150 to about 450 microinches. A plasma sprayed ceramic coating of aluminum oxide is deposited on the roughened surface of the stru...

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Bibliographische Detailangaben
Hauptverfasser: Lin, Shyh-Nung, Menzie, Mark D, Sommers, Joe F, Clawson, Daniel Owen, Mori, Glen T, Sharp, Lolita L
Format: Patent
Sprache:eng
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Zusammenfassung:A component for a substrate processing chamber has a structure composed of aluminum oxide. The structure has a roughened surface having a roughness average of from about 150 to about 450 microinches. A plasma sprayed ceramic coating of aluminum oxide is deposited on the roughened surface of the structure. The component may be a dome shaped ceiling of the chamber.