Preparation of largely HBr-free HCI gas and largely HBr-free aqueous HCI solution

The present invention relates to a process for preparing largely HBr-free HCl gas and largely HBr-free aqueous HCl solution, which comprises the following steps: The process of the present invention allows high-purity aqueous HCl solution for use in the semiconductor industry to be prepared inexpens...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Schläfer, Dieter, Guth, Josef, Schlimper, Hans-Ulrich
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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