Reticle repeater monitor wafer and method for verifying reticles
According to one embodiment, verifying a reticle may include patterning an inspected layer (-) according to a reticle pattern, depositing a contrast enhancing layer (-) on a patterned layer (-), and inspecting a reticle patterned formed in the inspected layer (-).
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | According to one embodiment, verifying a reticle may include patterning an inspected layer (-) according to a reticle pattern, depositing a contrast enhancing layer (-) on a patterned layer (-), and inspecting a reticle patterned formed in the inspected layer (-). |
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