Etching process for making electrodes

Substantially transparent electrodes are formed on a substrate by a process including forming on the substrate, in order, a bottom high index layer, a metallic conductive layer, and a top high index layer with a conductivity of at least about 400 Ω/square; and chemically etching the bottom high inde...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Lennhoff, Nancy S, Ram, Jyothsna
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Substantially transparent electrodes are formed on a substrate by a process including forming on the substrate, in order, a bottom high index layer, a metallic conductive layer, and a top high index layer with a conductivity of at least about 400 Ω/square; and chemically etching the bottom high index layer, the top high index layer and the conductive layer to form discrete electrodes in the metallic conductive layer.