Photomask and integrated circuit manufactured by automatically eliminating design rule violations during construction of a mask layout block

This invention relates in general to the field of photolithography, and more particularly to photomask and integrated circuit manufactured by automatically eliminating design rule violations during construction of a mask layout block. A photomask and integrated circuit manufactured by eliminating design rule violations during construction of a mask layout block are disclosed. A photomask includes a substrate and a patterned layer formed on at least a portion of the substrate. The patterned layer may be formed using a mask pattern file created by analyzing a selected position for a polygon in a mask layout block, identifying a design rule violation in the mask layout block if the selected position is less than a design rule from a technology file, and automatically preventing the polygon from being placed in the mask layout block at the selected position if the design rule violation is identified.