Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby

Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby

1) Field of the Invention In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed t...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Moors, Johannes Hubertus Josephina, Banine, Vadim Yevgenyevich, Leenders, Martinus Hendrikus Antonius, Werij, Henri Gerard Cato, Visser, Hugo Matthieu, Heerens, Gerrit-Jan, Ham, Erik Leonardus, Meiling, Hans, Loopstra, Erik Roelof, Donders, Sjoerd Nicolaas Lambertus
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:1) Field of the Invention In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.