Isolation mounts for use with vacuum chambers and their application in lithographic projection apparatuses

Isolation mounts for use with vacuum chambers and their application in lithographic projection apparatuses

1. Field of the Invention A reference frame provided in a vacuum chamber is supported by support pillars extending through and isolated from the vacuum chamber walls to isolate the reference frame from vibrations in the vacuum chamber. The gap between the support pillar and the vacuum chamber wall m...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Driessen, Johannes C, Bisschops, Theodorus H. J, Vijfvinkel, Jakob, Dona, Marinus J. J, Meuwese, Mark T, Schneider, Ronald M, Mors, Michel A, Visser, Hugo M
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
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Beschreibung
Zusammenfassung:1. Field of the Invention A reference frame provided in a vacuum chamber is supported by support pillars extending through and isolated from the vacuum chamber walls to isolate the reference frame from vibrations in the vacuum chamber. The gap between the support pillar and the vacuum chamber wall may be sealed by a low-stiffness seal. The low stiffness seal may be a three part seal allowing relative motion in six-degrees of freedom.