Purification of group IVb metal halides

Group IVb metal tetrahalides find use in the manufacture of integrated circuits and heavy metal glasses for fiber optics. In the manufacture of the integrated circuits and glasses, the industry desires a high purity Group IVb metal substantially free of trace elements. However, in the manufacture of Group IVb metal tetrahalides, e.g., titanium tetrahalide, trace levels of zirconium, hafnium and possibly Group Vb metals, such as niobium and tantalum may be present. It is desired that these metals be reduced in concentration from the Group IVb metal halide. This invention relates to an improved process for removing trace levels of Group IVb contaminants from a Group IVb metal tetrahalide of and particularly to a process for removing zirconium tetrachloride from titanium tetrachloride. The improvement resides in contacting a titanium tetrachloride feedstock containing trace impurities of zirconium tetrachloride or hafnium tetrachloride with a sufficient amount of titanium hydride to convert any zirconium tetrachloride or hafnium tetrachloride to a lower volatile compound. The resultant mixture is distilled and the titanium tetrachloride separated from the lower volatile zirconium or hafnium compounds.