Method and assembly for detecting a leak in a plasma system
The present invention generally relates to the field of plasma processes and, more particularly, to detecting leaks in systems utilized to perform such plasma processes. The present invention relates to a method and assembly for leak detection in a plasma system. The invention can accomplish not onl...
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Sprache: | eng |
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Zusammenfassung: | The present invention generally relates to the field of plasma processes and, more particularly, to detecting leaks in systems utilized to perform such plasma processes.
The present invention relates to a method and assembly for leak detection in a plasma system. The invention can accomplish not only leak detection, but also leak location while maintaining a plasma within the plasma system. Leak detection for the invention is achieved by obtaining spectral data of the plasma at one or more times while maintaining the plasma within the plasma system and comparing the same to predetermined spectral data of air. Upon a determination that air is present within the plasma system, one or more external surfaces of the plasma system are exposed to a test gas and the spectral data of the plasma is analyzed after each exposure to determine if the test gas is present in the system. If the test gas is present, a determination can be made that the particular external surface to which the test gas was applied is a leak location. |
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