Discharge source with gas curtain for protecting optics from particles

Discharge source with gas curtain for protecting optics from particles

This invention relates generally to the production of extreme ultraviolet and soft x-rays for projection lithography. A gas curtain device is employed to deflect debris that is generated by an extreme ultraviolet and soft x-ray radiation discharge source such as an electric discharge plasma source....

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Hauptverfasser: Fornaciari, Neal R, Kanouff, Michael P
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Sprache:eng
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creator Fornaciari, Neal R
Kanouff, Michael P
description This invention relates generally to the production of extreme ultraviolet and soft x-rays for projection lithography. A gas curtain device is employed to deflect debris that is generated by an extreme ultraviolet and soft x-ray radiation discharge source such as an electric discharge plasma source. The gas curtain device projects a stream of gas over the path of the radiation to deflect debris particles into a direction that is different from that of the path of the radiation. The gas curtain can be employed to prevent debris accumulation on the optics used in photolithography.
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title Discharge source with gas curtain for protecting optics from particles
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