Discharge source with gas curtain for protecting optics from particles
This invention relates generally to the production of extreme ultraviolet and soft x-rays for projection lithography. A gas curtain device is employed to deflect debris that is generated by an extreme ultraviolet and soft x-ray radiation discharge source such as an electric discharge plasma source....
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | This invention relates generally to the production of extreme ultraviolet and soft x-rays for projection lithography.
A gas curtain device is employed to deflect debris that is generated by an extreme ultraviolet and soft x-ray radiation discharge source such as an electric discharge plasma source. The gas curtain device projects a stream of gas over the path of the radiation to deflect debris particles into a direction that is different from that of the path of the radiation. The gas curtain can be employed to prevent debris accumulation on the optics used in photolithography. |
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