Multi pattern reticle

This invention relates to the field of fabricating integrated circuits. More particularly, this invention relates to the design, layout, and use of reticles in photolithographic manufacturing of integrated circuits. A reticle includes multiple different layer patterns selected from a group comprising same circuit layer patterns and different circuit layer patterns. The layer patterns are positioned on the reticle within borders and within a portion of a defined x by y array on the reticle. The reticle is used to produce an integrated circuit of a single design or integrated circuits of multiple designs.