Methods for fabricating a micro heat barrier

The present invention relates generally to highly effective thermal insulation, and more specifically to methods for fabricating a micro heat barrier comprising a highly reflective membrane supported by micron-scale microsupports fabricated using semiconductor and MEMS processing techniques. The pre...

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Bibliographische Detailangaben
Hauptverfasser: Marshall, Albert C, Kravitz, Stanley H, Tigges, Chris P, Vawter, Gregory A
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention relates generally to highly effective thermal insulation, and more specifically to methods for fabricating a micro heat barrier comprising a highly reflective membrane supported by micron-scale microsupports fabricated using semiconductor and MEMS processing techniques. The present invention also relates to processes for fabricating micro heat barriers. Methods for fabricating a highly effective, micron-scale micro heat barrier structure and process for manufacturing a micro heat barrier based on semiconductor and/or MEMS fabrication techniques. The micro heat barrier has an array of non-metallic, freestanding microsupports with a height less than 100 microns, attached to a substrate. An infrared reflective membrane (e.g., 1 micron gold) can be supported by the array of microsupports to provide radiation shielding. The micro heat barrier can be evacuated to eliminate gas phase heat conduction and convection. Semi-isotropic, reactive ion plasma etching can be used to create a microspike having a cusp-like shape with a sharp, pointed tip (