Method for forming thin-film layer for device and organic electroluminescence device

The present invention relates to a method for depositing a thin film layer for an element, and an organic electroluminescence element (referred to as an organic EL element), specifically to a method for depositing a thin layer/thin film layers for an element, comprising depositing two or more materials to be deposited (referred to as a material) by vacuum evaporation, so as to form one or more thin layers superior in homogeneity on a substrate to be deposited (referred to as a substrate), and an organic EL element produced by this film-depositing method. The present invention concerns a method of forming one or more thin films on a substrate by depositing two or more materials by vacuum evaporation, comprising, depositing each material under such control that ni value of the each material is k±0.5 wherein k is a constant from 2 to 5, when relationship between a deposition position and a film thickness of a material i on the substrate is approximated by the following equation (1):wherein Lis a distance from an evaporation source to a plane of the substrate in a perpendicular direction, Dis a film thickness of the material i at an intersection point of a perpendicular line from the evaporation source to the plane of the substrate, and Dis a film thickness of the material i at a position on the substrate which is apart from the evaporation source by a distance Lin a direction of an angle against the perpendicular line. By the method, a homogenous thin film layer for an element can be formed even on a substrate having large screen.