Six-axis positioning system having a zero-magnetic-field space

This invention claims priority of the German patent application 100 46 144.1 which is incorporated by reference herein. The invention refers to an arrangement for positioning substrates, in particular for positioning wafers, within a device that is provided for exposure of the substrates and/or for measurement on the substrates by means of radiation under high-vacuum conditions. The following are provided according to the present invention: a retention system (), displaceable on a linear guidance system (), for receiving the substrate, the guidance direction of the linear guidance system () being oriented parallel or substantially parallel to the Y coordinate of an X, Y, Z spatial coordinate system; drives for limited modification of the inclination of the guidance direction relative to the Y coordinate; drives for limited rotation of the linear guidance system (), including the retention system (), about the guidance direction; and drives for parallel displacement of the linear guidance system (), including the retention system (), in the direction of the X coordinate, the Y coordinate, and/or the Z coordinate.