Semiconductor integrated circuit device and method of manufacturing the same

1. Field of the Invention A semiconductor integrated circuit device including a memory cell comprising a memory cell selecting MISFET Qs formed on the main surface of a semiconductor substrate and an information storage capacitor C that is connected in series to said memory cell selecting MISFET Qs, and that have a lower electrode a capacitor insulator and an upper electrode wherein the lower electrode is made of a conductive material containing ruthenium dioxide (RuO) as principle ingredient and the capacitor insulator is made of crystalline tantalum pentoxide. Thus, the capacitance required for the memory cells of a 256 Mbits DRAM or those of a DRAM of a later generation can be secured.