Magnetic random access memory having a vertical write line

The present invention relates generally to semiconductor devices and more particularly to a magnetic random access memory (MRAM) device. A magnetic random access memory (MRAM) device is formed having a fixed magnetic layer, a free magnetic layer and a first dielectric layer between them in a recess....

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Bibliographische Detailangaben
1. Verfasser: Lage, Craig S
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention relates generally to semiconductor devices and more particularly to a magnetic random access memory (MRAM) device. A magnetic random access memory (MRAM) device is formed having a fixed magnetic layer, a free magnetic layer and a first dielectric layer between them in a recess. A metal plug and an optional second dielectric layer are also formed in the recess. The metal plug serves as a write path. A word line in the MRAM cell is the gate electrode of a transistor used to both write and read the MRAM device. To write the device a current travels in a substantially vertical direction and therefore only affects one MRAM cell, thereby not affecting adjacent cells. Data storage is thereby improved.