Micro electromechanical switch having self-aligned spacers

This invention generally relates to the fabrication of micro-electromechanical switching (MEMS) devices that can be fully integrated into current state of the art semiconductor fabrication processes, and more particularly, for incorporating self-aligned spacers or stops to reduce stiction between a movable beam and an electrode. A method of fabricating and the structure of a micro-electromechanical switch (MEMS) device provided with self-aligned spacers or bumps is described. The spacers are designed to have an optimum size and to be positioned such that they act as a detent mechanism for the switch to minimize problems caused by stiction. The spacers are fabricated using standard semiconductor techniques typically used for the manufacture of CMOS devices. The present method of fabricating these spacers requires no added depositions, no extra lithography steps, and no additional etching.