Inspection system with enhanced contrast
The present invention relates generally to an inspection system and an inspection method. More particularly, the present invention relates to an inspection system for and a method of inspecting a pattern on a reticle or photomask for defects and errors. An inspection tool or inspection system can be...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | The present invention relates generally to an inspection system and an inspection method. More particularly, the present invention relates to an inspection system for and a method of inspecting a pattern on a reticle or photomask for defects and errors.
An inspection tool or inspection system can be utilized to determine whether the appropriate pattern is on a reticle. The reticle can be associated with EUV lithographic tools. The system can utilize at least two pulse durations of light or an ultra-short pulse duration of light. The light is directed to the reticle and received by a detector. |
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