Partially protected novel trisphenols and process for production thereof

This invention relates to partially protected novel trisphenols and a process for production thereof. More particularly, the invention relates to partially protected trisphenols in which only specifically selected one or two of the three hydroxyl groups are protected with a protecting agent and which are suitable for use as a dissolution inhibitor in chemically amplified photoresists and a process for the production of such specifically partially protected trisphenols. The invention provides a partially protected trisphenol having the general formula (I) wherein Ris an alkyl group of 1-4 carbons or an alkoxyl group of 1-4 carbons, Ris an alkyl group of 1-6 carbons or a cycloalkyl group of 5 or 6 carbons, Xis a hydrogen atom, an alkoxycarbonylmethyl group wherein the alkyl group has 1-4 carbons, an alkoxycarbonyl group wherein the alkyl group has 1-4 carbons or a tetrahydropyranyl group, Xis a hydrogen atom, an alkoxycarbonylmethyl group wherein the alkyl group has 1-4 carbons, an alkoxycarbonyl group wherein the alkyl group has 1-4 carbons or a tetrahydropyranyl group, provided that when Xis a hydrogen atom, Xis not a hydrogen atom, and when Xis a hydrogen atom, Xis not a hydrogen atom; and m is an integer of 0, 1 or 2, and n is an integer of 0, 1, 2 or 3.