Hinged pellicles and methods of use

The present subject matter relates generally to the field of semiconductors and, more particularly, to hinged pellicles and methods of use. Apparatus and methods to protect a photomask that is used for semiconductor photolithography at wavelengths outside the visible spectrum include a hinged pellicle that is rotated away from the photomask during exposure. The pellicle can be transparent or opaque. In one embodiment, the photomask is supported by a photomask base, and the pellicle is hinged to one side of the photomask base. The pellicle can be moved away from the photomask by a robot arm. When covering the photomask base, the pellicle can be secured to it with a securing mechanism such as a vacuum arrangement. Methods of use are also described.