Method of manufacturing a device by means of a mask phase-shifting mask for use in said method

The invention relates to a method of manufacturing a device in at least one layer on a substrate, comprising the steps of: A method is described for imaging, by means of projection radiation, a phase-shifting mask pattern on a substrate for the purpose of configuring device features in the substrate. By using a mask pattern comprising mask features constituted by a phase transition () and two sub-resolution assist features (), arranged symmetrically with respect to the phase transition and having a mutual distance (p), device features having a wide variety of widths can be obtained by varying only the mutual distance.