Block copolymer composition, process for producing the same, and pressure-sensitive adhesive composition

This invention relates to poly(aromatic vinyl)/polyisoprene block copolymer compositions suitable for pressure-sensitive adhesive use, a process for producing the same, and pressure-sensitive adhesive compositions containing such block copolymer compositions. The present invention provides a composi...

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Bibliographische Detailangaben
Hauptverfasser: Komatsuzaki, Shigeru, Matsubara, Tetsuaki, Ishihara, Jun
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:This invention relates to poly(aromatic vinyl)/polyisoprene block copolymer compositions suitable for pressure-sensitive adhesive use, a process for producing the same, and pressure-sensitive adhesive compositions containing such block copolymer compositions. The present invention provides a composition which comprises a radial poly(aromatic vinyl)/polyisoprene block copolymer as a major component and which can be used as a more excellent pressure-sensitive ingredient. This composition is obtained by reacting a diblock polymer with a coupling agent having a functionality of 4 or higher in the presence of a coupling accelerator, and it contains (a) 1 to 34% by weight of a diblock polymer, (b) 34 to 99% by weight of a four-branch polymer, and (c) 0 to 50% by weight of a two-branch polymer and/or a three-branch polymer. The poly(aromatic vinyl)/polyisoprene block copolymer contained in the composition has a weight-average molecular weight (Mw) of 260,000 to 500,000, and the poly(aromatic vinyl)/polyisoprene block copolymer has a poly(aromatic vinyl) block content of 5 to 24% by weight.