Method and apparatus for process control of alignment in dual damascene processes
1. Field of the Invention The present invention is directed to a method of performing alignment during processing of a semiconductor device. The method is comprised of: performing alignment registration on a plurality of layers on said semiconductor device; measuring misregistration of said alignmen...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | 1. Field of the Invention
The present invention is directed to a method of performing alignment during processing of a semiconductor device. The method is comprised of: performing alignment registration on a plurality of layers on said semiconductor device; measuring misregistration of said alignment registration in relation to a predetermined standard alignment key; and generating an offset for a subsequent process layer on said semiconductor using said measure misregistration. |
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