Electrostatic chuck having improved electrical connector and method

Electrostatic chuck having improved electrical connector and method

The present invention relates to an electrostatic chuck for holding a substrate in a chamber. An electrostatic chuck comprises an electrical connector which is connected to the electrode to conduct an electrical charge to the electrode The electrical connector comprises a refractory metal having a m...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Shamouilian, Shamouil, Wang, You, Bedi, Surinder S, Kholodenko, Arnold, Veytser, Alexander M, Narendrnath, Kadthala R, Kats, Semyon L, Grimard, Dennis S, Cheng, Wing L, Kumar, Ananda H
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator Shamouilian, Shamouil
Wang, You
Bedi, Surinder S
Kholodenko, Arnold
Veytser, Alexander M
Narendrnath, Kadthala R
Kats, Semyon L
Grimard, Dennis S
Cheng, Wing L
Kumar, Ananda H
description The present invention relates to an electrostatic chuck for holding a substrate in a chamber. An electrostatic chuck comprises an electrical connector which is connected to the electrode to conduct an electrical charge to the electrode The electrical connector comprises a refractory metal having a melting temperature of at least about 1500° C., such as for example, tungsten, titanium, nickel, tantalum, molybdenum, or alloys thereof. Preferably, the electrical connector is bonded to the electrode by a metal having a softening temperature of less than about 600° C., such as aluminum, indium, or low melting point alloys.
format Patent
fullrecord <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_06462928</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>06462928</sourcerecordid><originalsourceid>FETCH-uspatents_grants_064629283</originalsourceid><addsrcrecordid>eNrjZHB2zUlNLinKLy5JLMlMVkjOKE3OVshILMvMS1fIzC0oyi9LTVFIBavJTE7MUUjOz8sDcvKLFBLzUhRyU0sy8lN4GFjTEnOKU3mhNDeDgptriLOHbmlxQWJJal5JcXx6USKIMjAzMTOyNLIwJkIJAITmM-A</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Electrostatic chuck having improved electrical connector and method</title><source>USPTO Issued Patents</source><creator>Shamouilian, Shamouil ; Wang, You ; Bedi, Surinder S ; Kholodenko, Arnold ; Veytser, Alexander M ; Narendrnath, Kadthala R ; Kats, Semyon L ; Grimard, Dennis S ; Cheng, Wing L ; Kumar, Ananda H</creator><creatorcontrib>Shamouilian, Shamouil ; Wang, You ; Bedi, Surinder S ; Kholodenko, Arnold ; Veytser, Alexander M ; Narendrnath, Kadthala R ; Kats, Semyon L ; Grimard, Dennis S ; Cheng, Wing L ; Kumar, Ananda H ; Applied Materials, Inc</creatorcontrib><description>The present invention relates to an electrostatic chuck for holding a substrate in a chamber. An electrostatic chuck comprises an electrical connector which is connected to the electrode to conduct an electrical charge to the electrode The electrical connector comprises a refractory metal having a melting temperature of at least about 1500° C., such as for example, tungsten, titanium, nickel, tantalum, molybdenum, or alloys thereof. Preferably, the electrical connector is bonded to the electrode by a metal having a softening temperature of less than about 600° C., such as aluminum, indium, or low melting point alloys.</description><language>eng</language><creationdate>2002</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/6462928$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,780,802,885,64039</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/6462928$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Shamouilian, Shamouil</creatorcontrib><creatorcontrib>Wang, You</creatorcontrib><creatorcontrib>Bedi, Surinder S</creatorcontrib><creatorcontrib>Kholodenko, Arnold</creatorcontrib><creatorcontrib>Veytser, Alexander M</creatorcontrib><creatorcontrib>Narendrnath, Kadthala R</creatorcontrib><creatorcontrib>Kats, Semyon L</creatorcontrib><creatorcontrib>Grimard, Dennis S</creatorcontrib><creatorcontrib>Cheng, Wing L</creatorcontrib><creatorcontrib>Kumar, Ananda H</creatorcontrib><creatorcontrib>Applied Materials, Inc</creatorcontrib><title>Electrostatic chuck having improved electrical connector and method</title><description>The present invention relates to an electrostatic chuck for holding a substrate in a chamber. An electrostatic chuck comprises an electrical connector which is connected to the electrode to conduct an electrical charge to the electrode The electrical connector comprises a refractory metal having a melting temperature of at least about 1500° C., such as for example, tungsten, titanium, nickel, tantalum, molybdenum, or alloys thereof. Preferably, the electrical connector is bonded to the electrode by a metal having a softening temperature of less than about 600° C., such as aluminum, indium, or low melting point alloys.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2002</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZHB2zUlNLinKLy5JLMlMVkjOKE3OVshILMvMS1fIzC0oyi9LTVFIBavJTE7MUUjOz8sDcvKLFBLzUhRyU0sy8lN4GFjTEnOKU3mhNDeDgptriLOHbmlxQWJJal5JcXx6USKIMjAzMTOyNLIwJkIJAITmM-A</recordid><startdate>20021008</startdate><enddate>20021008</enddate><creator>Shamouilian, Shamouil</creator><creator>Wang, You</creator><creator>Bedi, Surinder S</creator><creator>Kholodenko, Arnold</creator><creator>Veytser, Alexander M</creator><creator>Narendrnath, Kadthala R</creator><creator>Kats, Semyon L</creator><creator>Grimard, Dennis S</creator><creator>Cheng, Wing L</creator><creator>Kumar, Ananda H</creator><scope>EFH</scope></search><sort><creationdate>20021008</creationdate><title>Electrostatic chuck having improved electrical connector and method</title><author>Shamouilian, Shamouil ; Wang, You ; Bedi, Surinder S ; Kholodenko, Arnold ; Veytser, Alexander M ; Narendrnath, Kadthala R ; Kats, Semyon L ; Grimard, Dennis S ; Cheng, Wing L ; Kumar, Ananda H</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_064629283</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2002</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Shamouilian, Shamouil</creatorcontrib><creatorcontrib>Wang, You</creatorcontrib><creatorcontrib>Bedi, Surinder S</creatorcontrib><creatorcontrib>Kholodenko, Arnold</creatorcontrib><creatorcontrib>Veytser, Alexander M</creatorcontrib><creatorcontrib>Narendrnath, Kadthala R</creatorcontrib><creatorcontrib>Kats, Semyon L</creatorcontrib><creatorcontrib>Grimard, Dennis S</creatorcontrib><creatorcontrib>Cheng, Wing L</creatorcontrib><creatorcontrib>Kumar, Ananda H</creatorcontrib><creatorcontrib>Applied Materials, Inc</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Shamouilian, Shamouil</au><au>Wang, You</au><au>Bedi, Surinder S</au><au>Kholodenko, Arnold</au><au>Veytser, Alexander M</au><au>Narendrnath, Kadthala R</au><au>Kats, Semyon L</au><au>Grimard, Dennis S</au><au>Cheng, Wing L</au><au>Kumar, Ananda H</au><aucorp>Applied Materials, Inc</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Electrostatic chuck having improved electrical connector and method</title><date>2002-10-08</date><risdate>2002</risdate><abstract>The present invention relates to an electrostatic chuck for holding a substrate in a chamber. An electrostatic chuck comprises an electrical connector which is connected to the electrode to conduct an electrical charge to the electrode The electrical connector comprises a refractory metal having a melting temperature of at least about 1500° C., such as for example, tungsten, titanium, nickel, tantalum, molybdenum, or alloys thereof. Preferably, the electrical connector is bonded to the electrode by a metal having a softening temperature of less than about 600° C., such as aluminum, indium, or low melting point alloys.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_uspatents_grants_06462928
source USPTO Issued Patents
title Electrostatic chuck having improved electrical connector and method
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-26T16%3A03%3A59IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Shamouilian,%20Shamouil&rft.aucorp=Applied%20Materials,%20Inc&rft.date=2002-10-08&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E06462928%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true