Apparatus for detecting the endpoint of a photoresist stripping process

This disclosure relates generally to photoresist stripping processes, and more particularly to a method and apparatus for detecting the endpoint of a photoresist stripping process. A method and apparatus for detecting the endpoint of a photoresist stripping process. A wafer to be stripped of photore...

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Hauptverfasser:	Ni, Tuqiang, Collison, Wenli
Format:	Patent
Sprache:	eng
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creator	Ni, Tuqiang Collison, Wenli
description	This disclosure relates generally to photoresist stripping processes, and more particularly to a method and apparatus for detecting the endpoint of a photoresist stripping process. A method and apparatus for detecting the endpoint of a photoresist stripping process. A wafer to be stripped of photoresist is disposed inside a stripping chamber. After substantially all the photoresist is stripped from the wafer, the rate of a reaction of O and NO to form NOincreases, which increases the intensity of emitted light. A light detecting apparatus detects this increase in light intensity, which signals the endpoint of the photoresist stripping process.
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A method and apparatus for detecting the endpoint of a photoresist stripping process. A wafer to be stripped of photoresist is disposed inside a stripping chamber. After substantially all the photoresist is stripped from the wafer, the rate of a reaction of O and NO to form NOincreases, which increases the intensity of emitted light. 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A method and apparatus for detecting the endpoint of a photoresist stripping process. A wafer to be stripped of photoresist is disposed inside a stripping chamber. After substantially all the photoresist is stripped from the wafer, the rate of a reaction of O and NO to form NOincreases, which increases the intensity of emitted light. A light detecting apparatus detects this increase in light intensity, which signals the endpoint of the photoresist stripping process.</abstract><oa>free_for_read</oa></addata></record>
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title	Apparatus for detecting the endpoint of a photoresist stripping process
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