Apparatus for detecting the endpoint of a photoresist stripping process
This disclosure relates generally to photoresist stripping processes, and more particularly to a method and apparatus for detecting the endpoint of a photoresist stripping process. A method and apparatus for detecting the endpoint of a photoresist stripping process. A wafer to be stripped of photore...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| Zusammenfassung: | This disclosure relates generally to photoresist stripping processes, and more particularly to a method and apparatus for detecting the endpoint of a photoresist stripping process.
A method and apparatus for detecting the endpoint of a photoresist stripping process. A wafer to be stripped of photoresist is disposed inside a stripping chamber. After substantially all the photoresist is stripped from the wafer, the rate of a reaction of O and NO to form NOincreases, which increases the intensity of emitted light. A light detecting apparatus detects this increase in light intensity, which signals the endpoint of the photoresist stripping process. |
|---|