Stepper alignment process
The invention relates to the field of semiconductor device manufacture. In particular, the invention relates to processes for ensuring alignment of devices utilized in semiconductor device manufacture. A method of diagnosing alignment of a photolithography tool. A broad band source test is provided....
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| creator | Couillard, Edmund M Dajnowicz, Jonathan F Sullivan, Peter J |
| description | The invention relates to the field of semiconductor device manufacture. In particular, the invention relates to processes for ensuring alignment of devices utilized in semiconductor device manufacture.
A method of diagnosing alignment of a photolithography tool. A broad band source test is provided. A disturbing sequence is run that is not a portion of the broad band source test. The broad band source test is performed and post disturb test data recorded. A result of the broad band source test is compared with a tolerance. If in the comparison, the result of the broad band source test is not within the tolerance, the photolithography tool is mechanically adjusted. |
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A method of diagnosing alignment of a photolithography tool. A broad band source test is provided. A disturbing sequence is run that is not a portion of the broad band source test. The broad band source test is performed and post disturb test data recorded. A result of the broad band source test is compared with a tolerance. If in the comparison, the result of the broad band source test is not within the tolerance, the photolithography tool is mechanically adjusted.</description><language>eng</language><creationdate>2002</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/6430464$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,776,798,881,64012</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/6430464$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Couillard, Edmund M</creatorcontrib><creatorcontrib>Dajnowicz, Jonathan F</creatorcontrib><creatorcontrib>Sullivan, Peter J</creatorcontrib><creatorcontrib>International Business Machines Corporation</creatorcontrib><title>Stepper alignment process</title><description>The invention relates to the field of semiconductor device manufacture. In particular, the invention relates to processes for ensuring alignment of devices utilized in semiconductor device manufacture.
A method of diagnosing alignment of a photolithography tool. A broad band source test is provided. A disturbing sequence is run that is not a portion of the broad band source test. The broad band source test is performed and post disturb test data recorded. A result of the broad band source test is compared with a tolerance. If in the comparison, the result of the broad band source test is not within the tolerance, the photolithography tool is mechanically adjusted.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2002</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZJAMLkktKEgtUkjMyUzPy03NK1EoKMpPTi0u5mFgTUvMKU7lhdLcDApuriHOHrqlxQWJJUCFxfHpRYkgysDMxNjABEgQoQQAHsgjxQ</recordid><startdate>20020806</startdate><enddate>20020806</enddate><creator>Couillard, Edmund M</creator><creator>Dajnowicz, Jonathan F</creator><creator>Sullivan, Peter J</creator><scope>EFH</scope></search><sort><creationdate>20020806</creationdate><title>Stepper alignment process</title><author>Couillard, Edmund M ; Dajnowicz, Jonathan F ; Sullivan, Peter J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_064304643</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2002</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Couillard, Edmund M</creatorcontrib><creatorcontrib>Dajnowicz, Jonathan F</creatorcontrib><creatorcontrib>Sullivan, Peter J</creatorcontrib><creatorcontrib>International Business Machines Corporation</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Couillard, Edmund M</au><au>Dajnowicz, Jonathan F</au><au>Sullivan, Peter J</au><aucorp>International Business Machines Corporation</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Stepper alignment process</title><date>2002-08-06</date><risdate>2002</risdate><abstract>The invention relates to the field of semiconductor device manufacture. In particular, the invention relates to processes for ensuring alignment of devices utilized in semiconductor device manufacture.
A method of diagnosing alignment of a photolithography tool. A broad band source test is provided. A disturbing sequence is run that is not a portion of the broad band source test. The broad band source test is performed and post disturb test data recorded. A result of the broad band source test is compared with a tolerance. If in the comparison, the result of the broad band source test is not within the tolerance, the photolithography tool is mechanically adjusted.</abstract><oa>free_for_read</oa></addata></record> |
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| title | Stepper alignment process |
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