Stepper alignment process
The invention relates to the field of semiconductor device manufacture. In particular, the invention relates to processes for ensuring alignment of devices utilized in semiconductor device manufacture. A method of diagnosing alignment of a photolithography tool. A broad band source test is provided....
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | The invention relates to the field of semiconductor device manufacture. In particular, the invention relates to processes for ensuring alignment of devices utilized in semiconductor device manufacture.
A method of diagnosing alignment of a photolithography tool. A broad band source test is provided. A disturbing sequence is run that is not a portion of the broad band source test. The broad band source test is performed and post disturb test data recorded. A result of the broad band source test is compared with a tolerance. If in the comparison, the result of the broad band source test is not within the tolerance, the photolithography tool is mechanically adjusted. |
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