Method of controlling and improving SOG etchback etcher
(1) Field of the Invention A new method for improving particle level, stability of etch rate, and better etch uniformity by using a dry plasma clean to remove polymer buildup from the upper electrode and walls of an etch chamber after spin-on-glass etchback is described. An etching chamber having a...
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| Format: | Patent |
| Sprache: | eng |
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