Lithographic projection apparatus
The present invention relates to a lithographic projection apparatus comprising: In an interferometric alignment system provides an alignment signal for reproducibly registering a reticle with a wafer . The radiation from a laser , which is the illumination source for the interferometer, is modulate...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | The present invention relates to a lithographic projection apparatus comprising:
In an interferometric alignment system provides an alignment signal for reproducibly registering a reticle with a wafer . The radiation from a laser , which is the illumination source for the interferometer, is modulated by a phase modulator to eliminate spurious noise from the alignment signal. |
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