Embedded high-contrast distributed grating structures

The present invention relates generally to new methods of semiconductor device fabrication, and more particularly to methods to fabricate high-contrast distributed grating structures and semiconductor devices comprising such structures. A new class of fabrication methods for embedded distributed gra...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Zubrzycki, Walter J, Vawter, Gregory A, Allerman, Andrew A
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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