Magnetron sputtering cathode with magnet disposed between two yoke plates
This application is the national phase of international application PCT/EP97/07227 filed Dec. 22, 1997 which designated the U.S. The present invention relates to a device for cathode sputtering for producing coatings on a substrate by means of a sputtering cathode, which can be arranged in a vacuum...
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| Sprache: | eng |
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| Zusammenfassung: | This application is the national phase of international application PCT/EP97/07227 filed Dec. 22, 1997 which designated the U.S.
The present invention relates to a device for cathode sputtering for producing coatings on a substrate by means of a sputtering cathode, which can be arranged in a vacuum chamber and comprises pole shoes, a target and at least one magnet or ring magnet arranged concentrically with respect to the center axis of the sputtering cathode, wherein a divided yoke is arranged axially symmetrically with respect to the center axis of the sputtering cathode. |
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