Method for fabricating a trench isolation structure
Method for fabricating a trench isolation structure The invention provides a method for fabricating a trench isolation structure, comprising the following steps: forming a mask ( 3 ) on a substrate ( 1 ); forming at least one trench ( 2 ) in the substrate ( 1 ) by means of the mask ( 3 ); carrying o...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | Method for fabricating a trench isolation structure The invention provides a method for fabricating a trench isolation structure, comprising the following steps: forming a mask (
3
) on a substrate (
1
); forming at least one trench (
2
) in the substrate (
1
) by means of the mask (
3
); carrying out selective deposition of a first insulation material (
5
) to at least partially fill the at least one trench (
2
) in the substrate (
1
) with the insulation material (
5
) in the presence of the mask (
3
); and applying a second insulation material (
6
) over the entire surface of the structure in order to fill the at least one trench (
2
) in the substrate (
1
) at least up to the top side of the mask (
3
). |
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