Low firing temperature thick film dielectric layer for electroluminescent display
The present invention is a low firing temperature, composite thick film dielectric layer for an electroluminescent display. The composite thick film dielectric layer comprises; (a) a lower zone layer of a thick film composition comprising; one or more of lead magnesium niobate (PMN), lead magnesium...
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creator | Wu, Li Sung-II, Ahn Maizhi, Yang Xingwei, Wu Seong-Eui, Lee Daniel, J. Seale William, M. Smy Ye, Yufeng Hui, Zhang |
description | The present invention is a low firing temperature, composite thick film dielectric layer for an electroluminescent display. The composite thick film dielectric layer comprises;
(a) a lower zone layer of a thick film composition comprising;
one or more of lead magnesium niobate (PMN), lead magnesium niobate-titanate (PMN-PT), lead titanate, barium titanate and lead oxide; and
a glass frit composition comprising lead oxide, boron oxide and silicon dioxide;
(b) an upper zone comprising at least one layer of lead zirconate titanate (PZT) and/or barium titanate; and
(c) an intermediate composite zone comprising a composite of (a) and (b). |
format | Patent |
fullrecord | <record><control><sourceid>uspatents_EFI</sourceid><recordid>TN_cdi_uspatents_applications_20040247858</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>20040247858</sourcerecordid><originalsourceid>FETCH-uspatents_applications_200402478583</originalsourceid><addsrcrecordid>eNqVyrsKAjEQheE0FqK-w7QWQlhX3F4UCxvBfglxosPmxmSC-PYG9AWsDvznm6vrJb3AEVN8gGDIyEYqI8iT7NQOH-BO6NEKkwVv3sjgEsM3JV8DRSwWozRXcgNLNXPGF1z9dqHWp-PtcN7Uko00WEaTsydrhFIsY6d1r7t-P-yG7T_2A1dFP5k</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Low firing temperature thick film dielectric layer for electroluminescent display</title><source>USPTO Published Applications</source><creator>Wu, Li ; Sung-II, Ahn ; Maizhi, Yang ; Xingwei, Wu ; Seong-Eui, Lee ; Daniel, J. Seale ; William, M. Smy ; Ye, Yufeng ; Hui, Zhang</creator><creatorcontrib>Wu, Li ; Sung-II, Ahn ; Maizhi, Yang ; Xingwei, Wu ; Seong-Eui, Lee ; Daniel, J. Seale ; William, M. Smy ; Ye, Yufeng ; Hui, Zhang</creatorcontrib><description>The present invention is a low firing temperature, composite thick film dielectric layer for an electroluminescent display. The composite thick film dielectric layer comprises;
(a) a lower zone layer of a thick film composition comprising;
one or more of lead magnesium niobate (PMN), lead magnesium niobate-titanate (PMN-PT), lead titanate, barium titanate and lead oxide; and
a glass frit composition comprising lead oxide, boron oxide and silicon dioxide;
(b) an upper zone comprising at least one layer of lead zirconate titanate (PZT) and/or barium titanate; and
(c) an intermediate composite zone comprising a composite of (a) and (b).</description><language>eng</language><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20040247858$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,780,873,885,64059</link.rule.ids><linktorsrc>$$Uhttps://patentcenter.uspto.gov/applications/10326777$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Wu, Li</creatorcontrib><creatorcontrib>Sung-II, Ahn</creatorcontrib><creatorcontrib>Maizhi, Yang</creatorcontrib><creatorcontrib>Xingwei, Wu</creatorcontrib><creatorcontrib>Seong-Eui, Lee</creatorcontrib><creatorcontrib>Daniel, J. Seale</creatorcontrib><creatorcontrib>William, M. Smy</creatorcontrib><creatorcontrib>Ye, Yufeng</creatorcontrib><creatorcontrib>Hui, Zhang</creatorcontrib><title>Low firing temperature thick film dielectric layer for electroluminescent display</title><description>The present invention is a low firing temperature, composite thick film dielectric layer for an electroluminescent display. The composite thick film dielectric layer comprises;
(a) a lower zone layer of a thick film composition comprising;
one or more of lead magnesium niobate (PMN), lead magnesium niobate-titanate (PMN-PT), lead titanate, barium titanate and lead oxide; and
a glass frit composition comprising lead oxide, boron oxide and silicon dioxide;
(b) an upper zone comprising at least one layer of lead zirconate titanate (PZT) and/or barium titanate; and
(c) an intermediate composite zone comprising a composite of (a) and (b).</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EFI</sourceid><recordid>eNqVyrsKAjEQheE0FqK-w7QWQlhX3F4UCxvBfglxosPmxmSC-PYG9AWsDvznm6vrJb3AEVN8gGDIyEYqI8iT7NQOH-BO6NEKkwVv3sjgEsM3JV8DRSwWozRXcgNLNXPGF1z9dqHWp-PtcN7Uko00WEaTsydrhFIsY6d1r7t-P-yG7T_2A1dFP5k</recordid><startdate>20041209</startdate><enddate>20041209</enddate><creator>Wu, Li</creator><creator>Sung-II, Ahn</creator><creator>Maizhi, Yang</creator><creator>Xingwei, Wu</creator><creator>Seong-Eui, Lee</creator><creator>Daniel, J. Seale</creator><creator>William, M. Smy</creator><creator>Ye, Yufeng</creator><creator>Hui, Zhang</creator><scope>EFI</scope></search><sort><creationdate>20041209</creationdate><title>Low firing temperature thick film dielectric layer for electroluminescent display</title><author>Wu, Li ; Sung-II, Ahn ; Maizhi, Yang ; Xingwei, Wu ; Seong-Eui, Lee ; Daniel, J. Seale ; William, M. Smy ; Ye, Yufeng ; Hui, Zhang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_applications_200402478583</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2004</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Wu, Li</creatorcontrib><creatorcontrib>Sung-II, Ahn</creatorcontrib><creatorcontrib>Maizhi, Yang</creatorcontrib><creatorcontrib>Xingwei, Wu</creatorcontrib><creatorcontrib>Seong-Eui, Lee</creatorcontrib><creatorcontrib>Daniel, J. Seale</creatorcontrib><creatorcontrib>William, M. Smy</creatorcontrib><creatorcontrib>Ye, Yufeng</creatorcontrib><creatorcontrib>Hui, Zhang</creatorcontrib><collection>USPTO Published Applications</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Wu, Li</au><au>Sung-II, Ahn</au><au>Maizhi, Yang</au><au>Xingwei, Wu</au><au>Seong-Eui, Lee</au><au>Daniel, J. Seale</au><au>William, M. Smy</au><au>Ye, Yufeng</au><au>Hui, Zhang</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Low firing temperature thick film dielectric layer for electroluminescent display</title><date>2004-12-09</date><risdate>2004</risdate><abstract>The present invention is a low firing temperature, composite thick film dielectric layer for an electroluminescent display. The composite thick film dielectric layer comprises;
(a) a lower zone layer of a thick film composition comprising;
one or more of lead magnesium niobate (PMN), lead magnesium niobate-titanate (PMN-PT), lead titanate, barium titanate and lead oxide; and
a glass frit composition comprising lead oxide, boron oxide and silicon dioxide;
(b) an upper zone comprising at least one layer of lead zirconate titanate (PZT) and/or barium titanate; and
(c) an intermediate composite zone comprising a composite of (a) and (b).</abstract><oa>free_for_read</oa></addata></record> |
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title | Low firing temperature thick film dielectric layer for electroluminescent display |
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