Low firing temperature thick film dielectric layer for electroluminescent display

The present invention is a low firing temperature, composite thick film dielectric layer for an electroluminescent display. The composite thick film dielectric layer comprises; (a) a lower zone layer of a thick film composition comprising; one or more of lead magnesium niobate (PMN), lead magnesium niobate-titanate (PMN-PT), lead titanate, barium titanate and lead oxide; and a glass frit composition comprising lead oxide, boron oxide and silicon dioxide; (b) an upper zone comprising at least one layer of lead zirconate titanate (PZT) and/or barium titanate; and (c) an intermediate composite zone comprising a composite of (a) and (b).