Pattern forming method and apparatus used for semiconductor device, electric circuit, display module, and light emitting device
A pattern material supply unit ( 300 ) has a shower head ( 310 ) for producing a particle mist from the liquid pattern material ( 312 ) and discharging the mist. A process stage ( 318 ) on which the workpiece ( 20 ) is placed is disposed below the shower head ( 310 ). A hydrophobic processed mask wi...
Gespeichert in:
| Hauptverfasser: | , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| Zusammenfassung: | A pattern material supply unit (
300
) has a shower head (
310
) for producing a particle mist from the liquid pattern material (
312
) and discharging the mist. A process stage (
318
) on which the workpiece (
20
) is placed is disposed below the shower head (
310
). A hydrophobic processed mask with pattern forming openings is disposed on the surface of the workpiece (
20
). A voltage is applied by a dc power source (
328
) to the workpiece (
20
) by way of the intervening process stage (
318
) so that particles of the liquid pattern material (
312
) are attracted thereto by static attraction. The liquid pattern material adhering to the mask surface fills in the pattern forming openings disposed in the mask as a result of the process stage (
318
) rotating, and the liquid pattern material can be heated and solidified by an internal heater (
326
). |
|---|