Substrate material for X-ray optical components

There is provided a substrate material for an optical component for X-rays of wavelength R . The substrate includes (a) a glass phase made of amorphous material having a positive coefficient of thermal expansion, and (b) a crystal phase including microcrystallites having a negative coefficient of th...

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Bibliographische Detailangaben
Hauptverfasser: Dinger, Udo, Eisert, Frank, Weiser, Martin, Knapp, Konrad, Mitra, Ina, Morian, Hans
Format: Patent
Sprache:eng
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Zusammenfassung:There is provided a substrate material for an optical component for X-rays of wavelength R . The substrate includes (a) a glass phase made of amorphous material having a positive coefficient of thermal expansion, and (b) a crystal phase including microcrystallites having a negative coefficient of thermal expansion and a mean size of less than about 4 R . The substrate material has a stoichiometric ratio of the crystal phase to the glass phase such that a coefficient of thermal expansion of the substrate material is less than about 5×10 −6 K −1 in a temperature range of about 20° C. to 100° C. The substrate material, following a surface treatment, has a high spatial frequency roughness (HSFR) of less than about R /30 rms.