Ozone destructor

A system for processing a wafer using ozone includes an ozone gas source connecting into the process chamber. Wafers are held within a holder or fixture in the chamber. A chamber exhaust line connects the process chamber to an inlet at the top end of an ozone destructor. A system or cabinet exhaust line extends from an outlet also at the top end of the ozone destructor. A canister within the ozone destructor contains a catalyst. Exhaust flow from the process chamber moves down through the ozone destructor and then up through the catalyst. Saturation of the catalyst by condensing water vapor and loss of catalytic efficiency, is reduced. As the process chamber and chamber exhaust line are better isolated from the catalyst, potential for catalyst particles moving into the process chamber or chamber exhaust line, or for condensing vapor to back up in the chamber exhaust line, are reduced.