Retarding electron beams in multiple electron beam pattern generation

A multiple electron beam pattern generator includes a multiple electron beam source to generate a plurality of electron beams that are modulated according to pattern. An anode accelerates the electron beams, and then a beam retarding system generates a retarding electric potential about the electron beams to decrease the kinetic energy of the electron beams substantially near a substrate. A beam scanner scans the electron beams across the substrate. A substrate support supports the substrate, and a pattern is generated on the substrate.