Method for fabricating an anti-glare pixel-defining layer on an OLED panel

A method of the invention for forming a pixel-defining layer on an OLED panel is disclosed. The method of the invention for forming a pixel-defining layer on an OLED panel, comprising following steps: (A) providing a substrate; (B) forming a plurality of first electrodes on said substrate; (C) coating a layer of anti-glare compositions comprising non-photosensitive polyimide and light-absorbing pigments or dyes on said substrate; (D) first prebaking said substrate with said layer of said anti-glare compositions; (E) coating a layer of photoresist compositions on said layer of anti-glare compositions; (F) second prebaking said substrate with said anti-glare compositions and said photoresist; (G) forming patterns of said photoresist through exposing said substrate to masked radiation, developing said photoresist on said substrate, etching said layer of said anti-glare compositions and said photoresist at the same time to form patterned layers of said anti-glare polyimide or polyimide precursor compositions and patterned photoresist; and (I) baking said substrate with said patterned anti-glare polyimide or polyimide precursor compositions for crosslinking or curing to form said anti-glare pixel-defining layers.