Solvent stripper for removing polymer residue and method of using the same

A composition suitable for removing a polymer residue on a substrate in post metal solvent strip process substantially comprises water, alkanolamine and a sugar alcohol, and the amount of water is improved to about 20%. To remove the polymer residue, the composition of the invention is applied on a...

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Bibliographische Detailangaben
Hauptverfasser: Wu, Ching-Ping, Lee, H, Hung, Tsung-Yu, Lian, Nan-Tzu, Liu, Hsin-Cheng
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A composition suitable for removing a polymer residue on a substrate in post metal solvent strip process substantially comprises water, alkanolamine and a sugar alcohol, and the amount of water is improved to about 20%. To remove the polymer residue, the composition of the invention is applied on a substrate for about 5 min to 15 min at a temperature ranged from about 60° C. to 70° C. The lifetime of the composition is greatly extended from 12 hours to 48 hours by increasing the amount of water from 15% to 20%.