Method and system for estimating microelectronic fabrication product yield

Within a method for estimating a microelectronic fabrication product yield and a system for estimating the microelectronic fabrication product yield there is employed a specific mathematic algorithm for estimating yield of a new microelectronic fabrication product within at least one microelectronic...

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Bibliographische Detailangaben
Hauptverfasser: Liao, Yun-Wei, Ka, Regina, Chu, Mei-Ling
Format: Patent
Sprache:eng
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Zusammenfassung:Within a method for estimating a microelectronic fabrication product yield and a system for estimating the microelectronic fabrication product yield there is employed a specific mathematic algorithm for estimating yield of a new microelectronic fabrication product within at least one microelectronic fabrication facility. The specific algorithm is solved incident to parametric data correlation with existing production data within the at least one microelectronic fabrication facility.