ABNORMAL PHOTORESIST LINE/SPACE PROFILE DETECTION THROUGH SIGNAL PROCESSING OF METROLOGY WAVEFORM

A semiconductor manufacturing automation method for analyzing a patterned feature formed on a semiconductor layer is disclosed. At least one patterned feature is scanned to generate an amplitude modulated waveform signal of the line and neighboring space characteristics. Signal processing is automat...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Houge, Erik, Jessen, Scott, McIntosh, John, Vartuli, Catherine, Stevie, Fred
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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