Mass production of cross-section TEM samples by focused ion beam deposition and anisotropic etching

Mass production of cross-section TEM samples by focused ion beam deposition and anisotropic etching

A method of preparing a TEM sample. A focused ion beam is used to deposit- a mask on the material to be sampled. Reactive ion etching removes material not protected by the mask, leaving a wall thin enough to be imaged by TEM.

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Anciso, Adolfo, Tsung, Lancy
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A method of preparing a TEM sample. A focused ion beam is used to deposit- a mask on the material to be sampled. Reactive ion etching removes material not protected by the mask, leaving a wall thin enough to be imaged by TEM.