X-ray exposure method, x-ray exposure apparatus, fine structure and semiconductor device

Provided are an X-ray exposure method and an X-ray exposure apparatus capable of using exposure X-rays of short wavelengths advantageous for formation of a fine pattern by suppressing a fogging effect due to secondary electrons from a substrate enhanced in company with use of the exposure X-rays of...

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Bibliographische Detailangaben

Hauptverfasser:	Kitayama, Toyoki, Itoga, Kenji
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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